Impurities Confined in Quantum Structures

Impurities Confined in Quantum Structures

AngličtinaPevná vazba
Holtz Olof
Springer-Verlag Berlin and Heidelberg GmbH & Co. K
EAN: 9783540223207
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Podrobné informace

The dramatic impact of low dimensional semiconductor structures on c- rent and future device applications cannot be overstated. Research over the last decade has highlighted the use of quantum engineering to achieve p- viously unknown limits for device performance in research laboratories. The modi?ed electronic structure of semiconductor quantum structures results in transport and optical properties, which di?er from those of constituent bulk materials. The possibility to tailor properties, such as bandgap, strain, band o?set etc. , of two-dimensional (2D) semiconductors, e. g. quantum wells, for speci?c purposes has had an extensive impact on the electronics, which has resulted in a dramatic renewal process. For instance, 2D structures are today used in a large number of high speed electronics and optoelectronic appli- tions (e. g. detectors, light emitting diodes, modulators, switches and lasers) and in daily life, in e. g. LED-based tra?c lights, CD-players, cash registers. The introduction of impurities, also in very small concentrations, in a semiconductor can change its optical and electrical properties entirely. This attribute of the semiconductor is utilized in the manifoldness of their app- cations. This fact constitutes the principal driving force for investigation of the properties of the impurities in semiconductors. While the impurities in bulk materials have been investigated for a long time, and their properties are fairly well established by now, the corresponding studies of impurities in quantum wells is a more recent research area.
EAN 9783540223207
ISBN 3540223207
Typ produktu Pevná vazba
Vydavatel Springer-Verlag Berlin and Heidelberg GmbH & Co. K
Datum vydání 24. srpna 2004
Stránky 139
Jazyk English
Rozměry 235 x 155
Země Germany
Sekce Professional & Scholarly
Autoři Holtz Olof; Zhao Qing Xiang
Ilustrace VIII, 139 p.
Série Springer Series in Materials Science